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Modern high brilliance x-ray spectroscopy oriented beamlines

Beamline/
Facility
Insertion device
Energy rangeEnergy resolutionPhoton FluxBeam SizeOptics
ESRF ID26
2 35mm and 1 revolving 35/27 mm period undulators
2.4-27 keV Si(111) 1.4x10-4
Si(311) 3x10-5
Si(111) >1013 ph/s
Si(311) >2x1012 ph/s
600(H)x100(V) μm2
1000(H)x1000(V) μm2
Pre-mirror, DCM, H- & V-focusing bent mirrors (Pt, Si, Pd coating)
ESRF BM23
Bending magnet
5-75 keV Si(111)
Si(311)
Si(511)
Unfocused:
1.2x1011 ph/s@21 keV
Focused:
4x109 ph/s@21keV
Unfocused:
15(H) x1(V) mm2
Focused:
4(H)x4(V) μm2
DCM, flat and V-focusing mirrors (Si, Rh, Pt), KB mirrors
ESRF ID24
2 27mm, 1 32 mm and 1 revolving 27/32 undulators
5-27 keV
(E-dispersive)
Bragg @10keV
Si(111) 1.6x10-4
Si(311) 5x10-5
Laue @20keV
Si(111) 1.9x10-4
Si(311) 6x10-5
Si(111) Bragg
>2x1014 ph/s@10keV

Si(111) Laue
>1x1014 ph/s@20keV
Bragg
5 (H) x 5 (V) μm2

Laue
50 (H) x 50 (V) μm2
KB mirrors, Bragg/Laue Polychromator, V-focusing mirror
Diamond I20
Wiggler
(Two wigglers in one straight section)
Si(111):4-20keV
Si(311):7-34keV
Si(111) 1.3x10-4
Si(311) 2.8x10-5
>1012ph/s
@10keV
400(H)x300(V) μm2 Premirrors,4BCM, H- & V-Focusing mirror, Harmonic rejecting mirrors
PETRAIII-P64a
2 m undulator, 31.4 mm period length
Si(111):4-22 keV
Si(311):7-44 keV
Si(111) 1.4x10-4
Si(311) 6x10-5
1012-1013 ph/s 150(H) x 50(V) μm2 -
2000(H) x 1000(V) μm2
High heat load DCM, bendable cylindrical mirror for focusing, plane mirror (Si, Rh,Pt coated)
PETRAIII-P64b
tapered 2 m undulator, 31.4 mm period length
Si(111):4-22 keV
Si(311):7-44 keV
Si(111) 1.4x10-4
Si(311) 6x10-5
1011-1012 ph/s with tapered undulator 500(H) x 500(V) μm2 Quick-XAFS DCM, currently no mirrors
PETRAIII-P65
11 period mini-undulator
Si(111):4-22 keV
Si(311):7-44 keV
Si(111) 1.4x10-4
Si(311) 6x10-5
1011-1012 ph/s 1000(H) x 500(V) μm2 2 plane harmonic rejecting mirrors (Si, Rh,Pt coating) in front of the DCM
ALBA
CLÆSS
12 period wiggler
2.4-63 keV Si(111) 1.4x10-4
Si(311) 3x10-5
1012-1013 ph/s 300(H) x 200(V) μm2
4500(H) x 2500(V) μm2
Premirror, DCM, Troidal mirror (Si, Rh, Pt coating)
MAXIV
BALDER
38 period in-vacuum wiggler
2.4-40 keV Si(111) 1.4 x 10-4 Si(311) 3 x 10-5 1012-1013 ph/s 100(H) x 100(V) μm2
4500(H) x 2000(V) μm2
Premiror, DCM, Toroidal mirror (Si and Ir coating), Harmonic rejecting mirrors
SPring-8 BL46XU
140 period in-vacuum undulator
Si (111): 6-35 keV Si(111): 10-4 ~1013 ph/s <500(H)x500(V) μm2 Plane mirror, DCM, 2 horizontal focusing bent mirrors (Rh coating)
SPring-8
BL37XU
140-period in-vacuum undulator
Si(111): 4.5-37.7keV
Si(511):12-113keV
Si(111): 2x10-4
Si(511): 3x10-5
Si(111): 1012-1013 ph/s 700(H)x200(V) μm2,
KB mirrors:
100(H)x100(V) nm2
DCM, 2 horizontal focusing bent mirrors (Rh coating), KB mirrors
SPring-8
BL36XU
Tapered in-vacuum undulator
tandem channel-cut monos:
Si(111) :4.5-28 keV,
Si(220) :7-35 keV
Si(111): 2x10-4
Si(220): 1x10-4
1012〜1013 ph/s
Si(111): 4x1013 ph /s
@12keV
Si(220): 9x1012 ph/s
@13keV
200(H)x40(V) μm2
~ 1 (H)x1(V) mm2,
KB mirrors:
200(H)x200(V) nm2
~ 2(H)x2(V) μm2
Horizontal premirror, horizontal focusing mirror, channel-cut crystal monochromators, HAXPES-mono, 2 vertical focusing mirrors, KB mirrors
(all mirrors Rh,Pt coating)
SLS SuperXAS
Superbending magnet (wavelength shifter)
4.5-35 keV Si(111) 1.3x10-4
Si(311) 4x10-5
1013 ph/s 100(H) x 100(V) μm2
5(H) x 0.5(V) mm2
Premirror, DCM, Toroidal mirror (Si, Rh, Pt coating)
SSRF BL14W1
38-pole wiggler (1.2T)
4.5-18 keV Si(111)
8.5-50 keV Si(311)
Si(111) 1.5x10-4
Si(311) 5x10-5
1013 ph/s
(@10keV@300mA)
300(H) x 300(V) μm2 Premirror, DCM, Toroidal mirror, Harmonic rejecting mirror (Si, Rh, Ni coating)
SOLEIL SAMBA
Bending magnet radiation
4-43 keV Si(111) 1.2x10-4@5keV
Si(220) 6x10-5@15keV
10+12 ph/s
(@10keV)
300(H) x 200(V) μm2 Bent cylinder mirror, sagittal bend DCM, bent cylinder mirror
APS
10-ID-B
undulator
4.3-32 keV Si(111)
1x10-4
3x1013 ph/s
(@10 keV)
2000(H) x 20(V) μm2
3000(H) x 3000(V) μm2
DCM, vertically focusing HR mirror
APS
27-ID-B (RIXS)
Dual undulator
5-14 keV Diamond (111) + High resolution mono
1x10-5
2x1012 ph/s@9keV 45(H) x6(V) μm2
3(H) x 0.5(V) μm2
DCM, High resolution Mono., KB mirrors
APS 20-ID-B,C
Undulator
4.3-50 keV Si(111) 1.3x10-4,
Si(311) 3x10-5
2x1013 ph/s @9keV 2000(H)x1000(V),
400(H)x100(V),
15(H)x15(V)
2(H)x2(V) μm2
DCM, Rh coated Bent cylinder, KB mirrors
APS 9-BM-B,C
Bending magnet
2.1-25 keV Si(111) 1.5x10-4 Si(220) 6x10-5 1x1011 ph/s @10keV 1000(H)x500(V) μm2
100(H)x100(V) polycap
DCM, Rh coated bent cylinder, Rh coated Harmonic rejection mirror, polycapillary
APS 20-BM-B
Bending magnet
2.7-35 keV Si(111) 1.5x10-4 1x1011 ph/s @10keV 500(H)x500(V) μm2
30(H)x30(V) polycap
5(H)x5(V) KB mirrors
DCM, Al2O3/Pt coated bent cylinder, Rh coated harmonic rejection mirror, polycapillary, KB mirrors
Australian Synchrotron
XAS
1.9T wiggler
5-18.5 keV Si(111)
15-31 keV Si(311)
~1.5x10-4 Si(111)
~4x10-5 Si(311)
1010~1012 ph/s using Si(111)
109~1011 ph/s using Si(311)
200(H) x 200(V) μm2 fully focused or up to 5000(H) x 200(V) defocussesd Collimating mirror (Si, Rh, Pt coating), DCM, Focusing mirror (Rh, Pt coating), harmonic rejection mirror
Sirius
QUATI
3.2T Superbend (conceptual design)
4–40 keV Si(111) 10-4
Si(311) 10-5
1012 ph/s @ 10 keV 200(H)x80(V) μm2 Preliminary design: cylindrical premirror, channel-cut Q-EXAFS monochromator, cylindrical mirror
Sirius XAFS
3.2T superbend
5–30 keV Si(111) 10-4
Si(311) 10-5
1011 ph/s @ 14 keV 200(H)x80(v) μm2 Premirror (Rh, Pt, Si coating), DCM, toroidal mirror (Rh, Pt coating)
Sirius Carnauba, 21mm Undulator 2–15 keV Si(111) 10-4 1012 ph/s @ 10 keV 30x30 nm2 ; 1x1 µm2 Cylindrical and plane horizontal Premirrors, 4-bounce horizontal monochromator, KB mirrors
Sirius EMA, 19mm Undulator 3–25 keV Si(111) 10-4
Si(311) 10-5
1012 - 1013 ph/s @ 10keV 1(H)x0.2(V) µm2 ; 80x80 nm2 ;
7 (H)x3(V) µm2
Horizontal plane premirrors, DCM, KB mirrors
Canadian Lightsource
HXMA BL 06ID-1, 63-pole superconducting wiggler
5-40 keV Si(111) 10-4
Si(220) NOT AVAILABLE
1x1012 ph/s @12 keV 1500(H) x800(V) µm2 Premirror (Rh, Pt coating), DCM, toroidal mirror (Rh, Pt coating) Optional: KB mirrors
NSLSII
8-ID
Damping wiggler (planned)
4.9-36 keV Si(111)
Si(220)
1014 ph/s
(@10keV)
25(H)x25(V) µm2 Premirror, DCM, Focusing mirror, Higher harmonic rejection mirror, polycapillary focusing optics
NSLSII
8-BM
Bending magnet
1-8 keV (mainly 1-5keV) Si(111), InSb, Beryl, Quartz
10-4
<1012 ph/s @500mA Tunable:
1(H)x1(V)-100(H)x100(V) µm2
A pair of collimating mirrors (sub-mm), DCM, toroidal focusing mirror or KB mirrors (microbeam)
Photon Factory
BL-15A1
Short undulator
2.1-15 keV Si(111)
2x10-4
3.5x1011 ph/s @7.5keV 20(H)x20(V) µm2 Collimating mirror + double Bimorph mirror (H-focusing)
Bent flat mirror (V-focusing), Higher harmonic rejection mirror (Ni coating)